Stage
Grant | AliveTotal Raised
$150KLast Raised
$150K | 17 yrs agoAbout Silicon Photonics Group
Silicon Photonics Group is a company that received a STTR Phase I grant for a project entitled: Advanced Si-Ge-Sn-based Photonic Materials and Devices. Their research project aims to demonstrate prototype infrared light detectors and photovoltaic (solar cell) devices based on technology developed at Arizona State University. The new technology to be explored consists in growing optical-quality alloys of tin and germanium (Ge1-ySny) directly on silicon wafers. These alloys act as infrared materials, and they can also be used as templates for the subsequent growth of other semiconductors on silicon. Of particular interest for this project is the ternary alloy Ge1-x-ySixSny, grown for the first time at Arizona State University. Using this technology, it should be possible to build infrared detectors covering a spectral range previously inaccessible to silicon-based detectors, and to build multijunction photovoltaic devices for a more efficient capture of solar photons. The fabrication of semiconductor devices on cheap silicon wafers is of great significance because of the potentially enormous cost reductions and the possibility of integrating optoelectronic and microelectronic functions, which further reduces costs and contributes to system miniaturization. The infrared detectors proposed here cover the so-called telecom C-,L-, and U-bands within the wavelength window around 1500 nm, a region of great interest to the telecommunications industry. In the photovoltaics arena, the proposed devices have the potential to offer increased efficiencies to make crystalline silicon-based devices competitive with amorphous silicon solutions.
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Silicon Photonics Group is included in 2 Expert Collections, including Renewable Energy.
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Latest Silicon Photonics Group News
Mar 11, 2019
Singapore-based silicon photonic foundry services provider CompoundTek has partnered with the Silicon Photonics Group at the University of Southampton’s Optoelectronics Research Centre (ORC) – based in the Zepler Institute for Photonics and Nanoelectronics at the UK’s University of Southampton - to offer silicon photonics design services. Founded by professor Graham Reed at the University of Surrey in 1989 to support UK silicon photonics research, the Silicon Photonics Group has developed designs which have since become the industry standard in data centers, telecoms and high-performance computing applications, it is said. This industry partnership aims to accelerate the adoption of silicon photonics technology as a key enabler to transporting high levels of data, instrumental in enhancing operational efficiency and capacity within data centers. Silicon photonics technology is also paving the way for emerging applications such as data transfer, autonomous vehicles, telecoms, biomedical and artificial intelligence. CompoundTek says that, as it continues to gain traction and progress with customer expansion globally, it can offer combined design and foundry services that are expected to accelerate new industry entrants. Led by Reed, the design partnership with the ORC aims to facilitate new entrants into the silicon photonics industry by giving them access to value-added design services backed by CompoundTek’s foundry fabrication service. “CompoundTek looks forward to providing the marketplace silicon photonics’ design capabilities as a value-added service in addition to our existing foundry fabrication services,” says CEO Raj Kumar. “This strategic partnership reflects CompoundTek’s commitment to developing advanced solutions with real commercial benefits.” As one of the few global foundries or companies equipped to manufacture silicon photonics, CompoundTek’s services includes end-to-end industry expertise from process technology to product co-design to manufacturing with strategic design partners. The firm exhibited its silicon photonics solutions at the Optical Networking and Communication Conference & Exhibition (OFC 2019) in San Diego, CA, USA (3-7 March). See related items:
Silicon Photonics Group Frequently Asked Questions (FAQ)
Where is Silicon Photonics Group's headquarters?
Silicon Photonics Group's headquarters is located at 1489 S. Dove St., Gilbert.
What is Silicon Photonics Group's latest funding round?
Silicon Photonics Group's latest funding round is Grant.
How much did Silicon Photonics Group raise?
Silicon Photonics Group raised a total of $150K.
Who are the investors of Silicon Photonics Group?
Investors of Silicon Photonics Group include National Science Foundation.
Who are Silicon Photonics Group's competitors?
Competitors of Silicon Photonics Group include Bossa Nova Vision, Accustrata, Jem Enterprises, Meridian Deployment Corporation, M V Systems and 7 more.
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Compare Silicon Photonics Group to Competitors
Ambp Technology Corporation is a company that received a SBIR Phase I grant for a project entitled: Photovoltaic Laser Annealing System. Their project proposes to achieve recently reported gains in CIGS solar cell efficiency from in-situ laser deposition, by using an ex-situ laser annealing approach that is compatible with an existing pilot manufacturing system. The proposed ex-situ approach will not need to heat the substrate above the 425C value used to manufacture CIGS solar cells on flexible polyimide substrates. Solar cell technology is an energy alternative that can reduce America's dependence on fossil-fuel-generated electric power. A truly cost effective technology is to build cells using methods whose thermal budgets are low enough to enable the use of inexpensive polymer substrates, which enables large-area roll-to-roll processing and automated cell-to-cell connection techniques. AMBP Tech Corporation will develop and demonstrate a tool to improve solar cell performance that is immediately applicable in the solar-cell manufacturing marketplace.
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Gratings Incorporated is a company that received a STTR Phase I grant for a project entitled: High Efficiency Thin-film Photovoltaics on Low-cost Substrates by Layer Transfer. Their their award is funded under the American Recovery and Reinvestment Act of 2009 and their project will apply high aspect ratio, nm-scale, columnar, and crystalline Si structures as templates for high-quality growth of thin-film GaAs solar cells on low-cost flexible substrates. Sub-10-nm Si seed layers are expected to facilitate growth of low-defect density GaAs films. The aspect ratio of nm-scale structures also serve as sacrificial layers for removal of completed GaAs solar cell. Epitaxial growth and characterization of GaAs films on nm-scale Si structures will be carried out at the Center for High Technology at the University of New Mexico. Successful phase I STTR research will lead to commercialization of high (~ 20 %) efficient, flexible solar cells for applications in a wide range of terrestrial and space environments. Multiple substrate re-use and inherent large area processing capability of Si will result in significant cost reductions. High quality heteroepitaxial GaAs growth on Si has been a subject of intense research. Due to its direct bandgap, GaAs is attractive for a number of optoelectronics applications and its integration with Si-based microelectronics has been a cherished goal. The lattice and thermal expansion mismatches with Si make it difficult to grow good device quality layers. We have recently demonstrated as the Si seed dimension is reduced below 100 nm dimensions, the quality of heteroepitaxial growth increases rapidly. The nm-scale Si structures are formed using low-cost, large area methods based on conventional integrated circuit processing methods. Successful research effort will lead to reduction in PV generation costs, and enhanced applicability of thin-film PV in terrestrial and space environments because in contrast with competing thin-film solar cells, GaAs thin-film solar cells will not suffer from light-induced performance degradation.
Ultrasonic Technologies is a company that received a SBIR Phase I grant for a project entitled: Resonance Ultrasonic Vibrations for Defect Characterization in Solar Silicon Wafers. Their Phase I research project addresses fundamentals of the innovative experimental methodology for quick and accurate assessment of mechanical defects in solar-grade full-size (up to 210 mm) silicon (Si) wafers. The objective is to justify a commercial prototype of the Resonance Ultrasonic Vibrations (RUV) system which ultimately will be used as a real-time in-line process control tool for identification and rejection from a solar cell production line of mechanically unstable, i.e. fragile wafers due to periphery cracks and high level of residual stress. The broader impact of the program will be in the commercialization of the RUV system to address critical needs of the photovoltaic (PV) industry. The world-wide PV market exhibits a steady yearly up to 40% growth rate in recent years. There is potential for applying this approach to other technologies, such as stress monitoring in Silicon-on isolator wafers and SiGe epitaxial layers in high-speed electronics and adhesion quality assessment in thin polycrystalline Si films on glass for flat panel displays.
M V Systems is a company that received a SBIR Phase II grant for a project entitled: Fabrication of Low-bandgap Nano-crystalline SiGeC Thin Films Using the Plasma Enhanced Chemical Vapor Deposition (PECVD) Technique. Their their award is funded under the American Recovery and Reinvestment Act of 2009 project is to develop thin film tandem solar cells, comprising of nanocrystalline silicon and silicon carbon (nc-Si and nc-Si:C) absorber materials, with a conversion efficiency of ~20%. The phase I project successfully developed one of the key components, i.e. intrinsic nc-Si:C with a band gap, Eg, of ~ 1.5 eV and with good opto-electronic properties. This key material will be used initially in phase II to fabricate cells in a single junction configuration with an efficiency goal of ~10%. Previously, developed "device quality" nc-Si materials, with Eg ~1.1eV, were used to produce solar cells with efficiency ~8%. Integrating the two devices in a tandem junction configuration is forecast to yield efficiencies of ~18%. Further improvement in the tandem junction device efficiency,to ~20%, may be achieved via the use of buffer layers at the p/i or i/n interfaces and by increasing the grain size which would boost the open circuit voltage, Voc. Higher efficiency thin film tandem solar cells will be critical to achieving the low costs necessary to achieve widespread adoption of photovoltaic energy generating systems. M V Systems is a company that received a SBIR Phase I grant for a project entitled: Fabrication of low-bandgap nano-crystalline SiGeC thin films using the Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Their project will develop nanocrystalline SiGeC thin films with an optical bandgap (Eg) in the range of 1.6-1.8 eV, and enhanced absorption characteristics, leading to low-cost, high-efficiency (>20%) photovoltaic devices. Previous attempts at improving the photovoltaic efficiency have not been consistent and successful. The proposed approach uses plasma-enhanced chemical vapor deposition (PECVD) technique to deposit these films, which allows greater control of the process by being able to manipulate the plasma and electron temperatures to control the ion density in the plasma, with an independent control of the process parameters. This flexibility does not exist in the currently used techniques. With the proposed technique, stable and consistent films of SiGeC can be deposited on the desired substrate at moderate temperatures. If successfully developed, this technique could provide higher efficiency solar cells for the alternative energy market. The goal of highly stable films, high deposition efficiency and process scalability for large-scale manufacturing can only be achieved if the basic process can be proven. The broader impacts of this research will be in the low-cost photovoltaic (PV) devices for power generation market. If successfully completed, this research could lead to a strong partnership between solar cell manufacturers and equipment manufacturers, leading to a potentially lucrative photovoltaics market. Currently, electricity generated with available PV devices is 3-4 times more expensive as the conventional electricity. The selected materials (Si, Ge and C) for the thin film are abundantly available, which can significantly reduce the raw materials costs. A large body of basic knowledge of the requirements of solar electricity for the competitive market already exists, which makes the development of the process with a realistic performance target easy to achieve. The main challenge for achieving this goal lies in being able to control the deposition process to assure a stable and robust process, as the previous work has not been able to achieve consistent results. The initial target of producing a triple-junction thin-film solar cell is a worthy first product demonstration, which will prove the efficacy of the proposed technique, and attract third-party funding with little difficulty.
Anteos is a company that received a SBIR Phase II grant for a project entitled: Relief-Free Infrared Diffractive Optics Based on Semiconductor Materials. Their award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5) and their project will develop a new generation of relief-free thin-plate components of diffractive optics operating in the infrared region of spectrum. The diffractive optics employs volume phase holographic structures, which are optically recorded in semiconductor materials transparent at the infrared wavelengths using proprietary process of photo-modification for producing dramatic change of the material refractive index under illumination with low intensity light. Phase I of this project proved feasibility of the proposed concept by demonstrating photo modification of ZnSe infrared material and fabricating the first model components. The developed technology can be immediately applied to fabrication of diffractive optics, volume phase holographic gratings, and phase retardation plates for wavelengths up to 1.9 m, as well as antireflection layers for wavelengths up to 8 m. In Phase II project the technology will be optimized and applied to fabrication of the prototype components of infrared diffractive optics operating at longer wavelengths, including the important wavelength of CO2 laser 10.6 m and windows of atmospheric transparency 3-5 and 8-12 m. The developed photo-modification process is highly adaptable and creates a rich technology platform for fabrication of a broad range of products for a large variety of markets. Successful implementation of this technology will result in a new generation of high efficiency relief-free infrared diffractive optics and sub-wavelength components, including diffraction gratings, beam splitters, beam shapers, semiconductor materials with artificial birefringence, phase retardation plates and wave plates. The relief-free components of infrared diffractive optics based on semiconductor materials are capable to withstand high light intensities and perform complicated light management functions. Another important application is the fabrication of highly stable anti-reflection (AR) layers on infrared semiconductor optics. The market for infrared diffractive optics includes defense and airspace industry, laser industry, spectral devices, sensors and detectors, night vision optics, industrial process control, material processing, cutting and welding, environmental monitoring, medical diagnostics and surgery. Anteos is a company that received a SBIR Phase II grant for a project entitled: High-Efficiency Nanocomposite Photovoltaics and Solar Cells. Their project is focused on development of an innovative technology for fabrication of high-efficiency thin film nanocomposite photovoltaic materials and solar cells taking advantage of the recently discovered effect of carrier multiplication in semiconductor nanocrystals. The proposed concept employs smart design of the solar cells providing fast and effective spatial separation of electrons and holes photo-generated in the nanocrystals. The proposed reach nanotechnology platform solves the challenging problem of electrical communications with nanoscale objects, such as nanocrystals, nanorods, nanowires, nanotubes, etc. It can be employed for development of many other nanocomposite optoelectronic devices having numerous commercial and military applications. If successful the development of new generation of high-efficiency photovoltaic materials and solar cells based on the demonstrated technology will have broad impact on the entire solar energy industry resulting in considerable energy savings and environmental protection. The technology has great commercialization potential and niche market. The proposed all-inorganic, high-efficiency, thin film, flexible nanostructured photovoltaic materials and solar cells, which can operate in extreme environment conditions and offer significant mass and volume savings, are ideally suitable for numerous applications, including power generating residential rooftops, power supplies for utility grid, emergency signals and telephones, water pumps, activate switches, battery chargers, residential and commercial lighting, etc.
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